The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2017
Filed:
Feb. 09, 2016
Kabushiki Kaisha Toshiba, Minato-ku, JP;
Kazuhiro Segawa, Kuwana, JP;
Kabushiki Kaisha Toshiba, Minato-ku, JP;
Abstract
According to one embodiment, a controller calculates wafer alignment residuals from results of wafer alignment measurement and calculates shape change displacement residuals from the surface shape of a wafer. Further, the controller calculates first conversion coefficients that are ratios of the wafer alignment residuals to the shape change displacement residuals and generates fine wafer alignment residual data by using the first conversion coefficients. Furthermore, the controller generates correction information in which first correction values at the time of the exposure processing are calculated for every shot on the wafer by using the fine wafer alignment residual data. Then, the controller controls exposure processing in an exposure unit by using the correction information corresponding to the shot of the wafer.