The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2017
Filed:
Jun. 07, 2015
National Tsing Hua University, Hsinchu, TW;
Arnold Chang-Mou Yang, Hsinchu, TW;
Wei-Chun Chen, Changhua County, TW;
NATIONAL TSING HUA UNIVERSITY, Hsinchu, TW;
Abstract
A method of patterning a thin film includes steps as follows. The thin film is formed. The thin film includes a plurality of first molecules, and each of the first molecules has a conjugated structure. A mask is covered on the thin film. The mask includes at least one exposing area, and the exposing area is correspondent to an illuminated region of the thin film. A solvent annealing and illuminating step is conducted, wherein the thin film covered by the mask is illuminated with a light source under an atmosphere of a first solvent, and a wavelength range of the light source is correspondent to an energy enabling the first molecules to reach an excited state. Thus a thickness of the illuminated region of the thin film is increased or decreased so as to form a pattern on the thin film.