The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2017
Filed:
Apr. 16, 2010
Geoffrey Facer, Lane Cove, AU;
Robert Grossman, South San Francisco, CA (US);
Marc Unger, San Mateo, CA (US);
Phillip Lam, San Francisco, CA (US);
Hou-pu Chou, Synnyvale, CA (US);
Jake Kimball, Oakland, CA (US);
Martin Pieprzyk, Belmont, CA (US);
Antoine Daridon, Mont-sur-Rolle, CH;
Geoffrey Facer, Lane Cove, AU;
Robert Grossman, South San Francisco, CA (US);
Marc Unger, San Mateo, CA (US);
Phillip Lam, San Francisco, CA (US);
Hou-Pu Chou, Synnyvale, CA (US);
Jake Kimball, Oakland, CA (US);
Martin Pieprzyk, Belmont, CA (US);
Antoine Daridon, Mont-sur-Rolle, CH;
Fluidigm Corporation, South San Francisco, CA (US);
Abstract
Methods and systems are provided for conducting a reaction at a selected temperature or range of temperatures over time. An array device is provided. The array device contains separate reaction chambers and is formed as an elastomeric block from multiple layers. At least one layer has at least one recess that recess has at least one deflectable membrane integral to the layer with the recess. The array device has a thermal transfer device proximal to at least one of the reaction chambers. The thermal transfer device is formed to contact a thermal control source. Reagents for carrying out a desired reaction are introduced into the array device. The array device is contacted with a thermal control device such that the thermal control device is in thermal communication with the thermal control source so that a temperature of the reaction in at least one of the reaction chamber is changed as a result of a change in temperature of the thermal control source.