The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2017

Filed:

Jan. 13, 2012
Applicants:

Tohru Sonoda, Osaka, JP;

Shinichi Kawato, Osaka, JP;

Satoshi Inoue, Osaka, JP;

Satoshi Hashimoto, Osaka, JP;

Inventors:

Tohru Sonoda, Osaka, JP;

Shinichi Kawato, Osaka, JP;

Satoshi Inoue, Osaka, JP;

Satoshi Hashimoto, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05B 33/14 (2006.01); H01L 27/32 (2006.01); H01L 51/56 (2006.01); H01L 51/00 (2006.01); C23C 14/04 (2006.01); C23C 14/54 (2006.01);
U.S. Cl.
CPC ...
H05B 33/145 (2013.01); C23C 14/042 (2013.01); C23C 14/54 (2013.01); H01L 27/3211 (2013.01); H01L 51/0002 (2013.01); H01L 51/56 (2013.01); Y10T 428/24612 (2015.01);
Abstract

A film formation substrate is arranged such that (i) a base end, in a y-axis direction, of a film-thickness-gradually-diminishing part of a first film overlaps a first film formation region, and (ii) a film-thickness-gradually-diminishing part of a second film is disposed on an outside, in the y-axis direction, of a second film formation region and overlaps the film-thickness-gradually-diminishing part of the first film so as to compensate for a gradually diminished thickness of the film-thickness-gradually-diminishing part.


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