The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2017

Filed:

May. 20, 2013
Applicant:

Ntt Docomo, Inc., Chiyoda-ku, JP;

Inventors:

Tamami Maruyama, Chiyoda-ku, JP;

Yasuhiro Oda, Chiyoda-ku, JP;

Jiyun Shen, Chiyoda-ku, JP;

Ngoc Hao Tran, Chiyoda-ku, JP;

Assignee:

NTT DOCOMO, INC., Chiyoda-ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 15/14 (2006.01); H01Q 15/00 (2006.01);
U.S. Cl.
CPC ...
H01Q 15/14 (2013.01); H01Q 15/008 (2013.01);
Abstract

A reflectarray reflects an incident wave in a desired direction, and the reflectarray includes a plurality of elements arranged in a first direction and in a second direction perpendicular to the first direction. The elements reflect the incident wave. A phase of a reflected wave by one element among the plurality of elements differs from a phase of the reflected wave by an element adjacent to the one element in the first direction by a predetermined value, and the phase of the reflected wave by the one element is equal to a phase of the reflected wave by an element adjacent to the one element in the second direction. Gap sizes between patches of a predetermined plural number of elements arranged in the first direction vary from a smallest value to a largest value. Here, an oblique TM incidence is utilized at a spurious resonance frequency.


Find Patent Forward Citations

Loading…