The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2017
Filed:
Apr. 06, 2015
Samsung Display Co., Ltd., Yongin, KR;
Samsung Display Co., Ltd., Yongin-si, KR;
Abstract
The optical patterning mask had a protection layer on a light absorption layer. It prevents the light absorption layer from damaged by the cleaning gas when processing the used optical patterning mask for reuse. The protection layer may be made of the same material as bank layer or of material different from the bank layer. The bank layer defines the boundary of the area to be transferred in the transfer layer. The protection layer of the present invention can maintain longer the transfer efficiency of the optical patterning mask, even when the same mask is used repeatedly after cleaning, since the light absorption layer protected from cleaning process can maintain longer its heat conversion property.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile