The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2017
Filed:
Sep. 30, 2015
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Takamichi Fujii, Kanagawa, JP;
Akihiro Mukaiyama, Kanagawa, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01); H01L 41/332 (2013.01); H01L 41/29 (2013.01); H01L 41/047 (2006.01); H01L 41/187 (2006.01);
U.S. Cl.
CPC ...
H01L 41/332 (2013.01); H01L 41/0477 (2013.01); H01L 41/1875 (2013.01); H01L 41/1876 (2013.01); H01L 41/29 (2013.01);
Abstract
In a method for etching a piezoelectric film and a manufacturing method thereof, a piezoelectric film is formed on a substrate on which a lower electrode is formed, a metal film having a thickness of 20 nm to 300 nm is formed, a patterned resist film is formed, the metal film is etched with a first etchant to which the piezoelectric film has etching resistance, and the piezoelectric film is etched with a second etchant to which the metal film has etching resistance.