The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2017

Filed:

Feb. 27, 2015
Applicant:

Toyota Jidosha Kabushiki Kaisha, Toyota-shi, Aichi-ken, JP;

Inventors:

Yasuhiro Hirabayashi, Toyota, JP;

Satoru Machida, Nagakute, JP;

Yusuke Yamashita, Nagakute, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/739 (2006.01); H01L 27/06 (2006.01); H01L 29/868 (2006.01); H01L 29/10 (2006.01); H01L 21/265 (2006.01); H01L 29/04 (2006.01); H01L 29/32 (2006.01); H01L 29/66 (2006.01); H01L 29/36 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0664 (2013.01); H01L 21/26513 (2013.01); H01L 29/04 (2013.01); H01L 29/1095 (2013.01); H01L 29/32 (2013.01); H01L 29/36 (2013.01); H01L 29/66348 (2013.01); H01L 29/7397 (2013.01); H01L 29/868 (2013.01); H01L 2924/13055 (2013.01);
Abstract

A semiconductor device for restraining snapback is provided. The semiconductor device includes IGBT and diode regions. In a view of n-type impurity concentration distribution along a direction from a front surface to a rear surface, a local minimum value of an n-type impurity concentration is located at a border between cathode and buffer regions. A local maximum value of n-type impurity concentration is located in the buffer region. At least one of the buffer and cathode regions includes a crystal defect region having crystal defects in a higher concentration than a region therearound. A peak of a crystal defect concentration in a view of crystal defect concentration distribution along the direction from the front surface to the rear surface is located in a region on the rear surface side with respect to a specific position having the n-type impurity concentration which is a half of the local maximum value.


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