The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2017
Filed:
Jan. 13, 2014
Applicant:
Wacker Chemie Ag, Munich, DE;
Inventors:
Barbara Mueller, Burgkirchen, DE;
Thomas Koch, Burghausen, DE;
Assignee:
Wacker Chemie AG, Munich, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B 33/035 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02595 (2013.01); C01B 33/035 (2013.01); H01L 21/0262 (2013.01); H01L 21/02532 (2013.01);
Abstract
The Siemens process for deposition of polycrystalline silicon in the form of rods in a sealed reactor is improved by, after introduction of deposition gas has ceased, introducing a ventilating gas into the partially sealed reactor, withdrawing a gas stream from the reactor, and monitoring the components in the gas stream withdrawn until a desired concentration of one or more components is reached, and opening the reactor to remove the rods.