The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2017

Filed:

May. 27, 2016
Applicant:

Seagate Technology Llc, Cupertino, CA (US);

Inventors:

Michael C. Kautzky, Eagan, MN (US);

Mark H. Ostrowski, Lakeville, MN (US);

David Michael Grundman, Shakopee, MN (US);

Martin Blaber, Plymouth, MN (US);

Assignee:

Seagate Technology LLC, Cupertino, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/33 (2006.01); G11B 11/00 (2006.01); G11B 5/31 (2006.01); G11B 5/00 (2006.01);
U.S. Cl.
CPC ...
G11B 5/3169 (2013.01); G11B 5/3109 (2013.01); G11B 2005/0021 (2013.01);
Abstract

Methods of forming a NFT the methods including forming a hard mask positioned over at least a portion of the rod, the hard mask including at least one layer; patterning a resist mask over the hard mask, the resist mask having an edge positioned over at least a portion of the rod; etching a portion of the hard mask to expose a back edge of the rod and to form a back edge of the hard mask, wherein the back edge of the rod is equivalent to the back edge of the peg; and wherein a forward portion of the rod which is the portion of the rod forward of the back edge is covered by the hard mask; forming a disc mask including a void configured to form a disc of a NFT, the disc mask being formed over at least a portion of the hard mask so that the exposed back edge of the rod is within the void configured to form the disc; etching an area exposed in the void of the disc mask to remove both a rear portion of the rod and the surrounding dielectric up to the back edge of the hard mask edge; depositing a disc material in the etched void, wherein the back edge of the hard mask defines the front edge of the disc and the back edge of the rod is in contact with the front edge of the disc; and polishing the deposited disc material to form a top surface substantially planar with the top of the forward rod portion.


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