The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2017
Filed:
Feb. 15, 2010
Mohammed Ibn-elhaj, Allschwil, CH;
Julien Martz, Mulhouse, FR;
Hubert Seiberle, Weil am Rhein, DE;
Wolfgang Wernet, Neuenburg, DE;
Mohammed Ibn-Elhaj, Allschwil, CH;
Julien Martz, Mulhouse, FR;
Hubert Seiberle, Weil am Rhein, DE;
Wolfgang Wernet, Neuenburg, DE;
ROLIC AG, Zug, CH;
Abstract
The present invention relates to a method for the replication of a patterned surface relief microstructure, comprising the steps of generation of a first layer with a patterned surface relief microstructure, generation of a master, by copying the microstructure of the first layer into a second layer, thereby involving at least one dry or wet etching step, characterized by an additional step, in which the microstructure of the master is brought into contact with a replica material, such that the microstructure of the master is reproduced in the replica. The invention further relates to the elements made as a replica according to the method. The surface relief microstructures are suitable to display images with a positive-negative and/or color image flip. The elements according to the invention are particularly useful for securing documents and articles against counterfeiting and falsification.