The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2017

Filed:

Dec. 28, 2015
Applicant:

Samsung Display Co., Ltd, Yongin-si, Gyeonggi-do, KR;

Inventors:

Seul Ki Kim, Incheon, KR;

Seung Jin Kim, Asan-si, KR;

Yun Seok Han, Cheonan-si, KR;

Dong Ju Yang, Seoul, KR;

Jeong Uk Heo, Asan-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); G02F 1/1343 (2006.01); G02F 1/1333 (2006.01); G02F 1/1368 (2006.01); G02F 1/1362 (2006.01);
U.S. Cl.
CPC ...
G02F 1/13439 (2013.01); G02F 1/1368 (2013.01); G02F 1/133345 (2013.01); G02F 1/134309 (2013.01); G02F 1/136286 (2013.01); H01L 27/124 (2013.01); H01L 27/1248 (2013.01); H01L 27/1262 (2013.01); G02F 2001/136295 (2013.01);
Abstract

A method for manufacturing a liquid crystal display, including: preparing a substrate on which a switching element, laminating a conductive material layer and a conductive metal layer, forming a first photosensitive film pattern on the conductive metal layer, the first photosensitive film pattern comprising a first region having a first thickness and a second region having a second thickness greater than the first thickness, forming a conductive metal pattern by etching the conductive metal layer using the first photosensitive film pattern as a mask, forming a second photosensitive film pattern that exposes a part of the conductive metal pattern by removing the first region of the first photosensitive film pattern, forming a common electrode by etching the conductive material layer by using the conductive metal pattern as a mask and forming an auxiliary electrode by etching the exposed conductive metal pattern using the second photosensitive film pattern as a mask.


Find Patent Forward Citations

Loading…