The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2017

Filed:

Dec. 02, 2011
Applicant:

Cynthia G. Templeman, Ypsilanti, MI (US);

Inventor:

Cynthia G. Templeman, Ypsilanti, MI (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 3/06 (2006.01); B05D 3/02 (2006.01); C09D 4/00 (2006.01); B05D 7/14 (2006.01);
U.S. Cl.
CPC ...
B05D 3/06 (2013.01); B05D 3/0209 (2013.01); C09D 4/00 (2013.01); B05D 3/067 (2013.01); B05D 7/14 (2013.01);
Abstract

The invention relates to a method for forming a coating on a substrate material which includes applying one or more layers of a monomer composition to a surface of the substrate. At least one monomer layer comprises a photoinitiator, and at least one monomer layer comprises a photo-generated base precursor. The monomer layer is exposed to a first wavelength of light to initiate polymerization of the monomers. The monomer layer is subsequently exposed to a second wavelength of light to terminate the polymerization.


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