The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2017

Filed:

Mar. 12, 2015
Applicant:

Pall Corporation, Port Washington, NY (US);

Inventors:

Khaled Abdel-Hakim Helmy Aamer, Port Washington, NY (US);

Amarnauth Singh, Selden, NY (US);

Selina Shi, Levittown, NY (US);

Assignee:

Pall Corportaion, Port Washington, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 71/80 (2006.01); B01D 67/00 (2006.01); B01D 71/62 (2006.01); B01D 71/52 (2006.01); B01D 71/72 (2006.01);
U.S. Cl.
CPC ...
B01D 71/80 (2013.01); B01D 67/0016 (2013.01); B01D 71/62 (2013.01); B01D 71/52 (2013.01); B01D 71/72 (2013.01); B01D 2323/00 (2013.01);
Abstract

Disclosed are membranes formed from self-assembling diblock copolymers of the formula (I): wherein R-R, n, and m are as described herein, which find use in preparing porous membranes. Embodiments of the membranes contain the diblock copolymer self-assembled into a cylindrical morphology. Also disclosed is a method of preparing such membrane which involves spray coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by annealing the thin film in a solvent vapor and/or soaking in a solvent or mixture of solvents to form a nanoporous membrane.


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