The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2017

Filed:

Jan. 23, 2015
Applicant:

Korea University Research and Business Foundation, Seoul, KR;

Inventors:

Sang Sig Kim, Seoul, KR;

Young In Jeon, Hanam-si, KR;

Min Suk Kim, Bucheon-si, KR;

Doo Hyuk Lim, Seoul, KR;

Yoonjoong Kim, Seoul, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/775 (2006.01); H01L 29/66 (2006.01); H01L 21/02 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); H01L 29/423 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 29/775 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); H01L 21/02601 (2013.01); H01L 29/0673 (2013.01); H01L 29/42364 (2013.01); H01L 29/66439 (2013.01); H01L 2924/13061 (2013.01);
Abstract

A semiconductor device comprising: an insulation substrate; an intrinsic semiconductor nanowire formed on the insulation substrate and having both ends doped in a p-type and an n-type, respectively and a region, which is not doped, between the doped region; doped region electrodes formed on each of the p-type doped region and the n-type doped region of the semiconductor nanowire; a lower insulation layer formed on an intrinsic region of the semiconductor nanowire; an intrinsic region electrode formed on a part of the lower insulation layer; and a metal or semiconductor nanoparticle region formed on the lower insulation layer and between the intrinsic region electrode and the doped region electrode and spaced apart from the electrodes.


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