The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2017

Filed:

Mar. 10, 2014
Applicant:

The United States of America As Represented BY the National Aeronautics and Space Administration, Washington, DC (US);

Inventors:

Sang Hyouk Choi, Poquoson, VA (US);

Yeonjoon Park, Yorktown, VA (US);

Glen C. King, Williamsburg, VA (US);

Hyun-Jung Kim, Poquoson, VA (US);

Kunik Lee, Troy, MI (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/04 (2006.01); H01L 29/165 (2006.01); H01L 29/15 (2006.01); H01L 31/0352 (2006.01); H01L 31/0368 (2006.01); H01L 35/22 (2006.01); H01L 29/778 (2006.01);
U.S. Cl.
CPC ...
H01L 29/045 (2013.01); H01L 29/155 (2013.01); H01L 29/165 (2013.01); H01L 31/03682 (2013.01); H01L 31/035236 (2013.01); H01L 35/22 (2013.01); H01L 29/7782 (2013.01); Y02E 10/546 (2013.01);
Abstract

An electronic device includes a trigonal crystal substrate defining a (0001) C-plane. The substrate may comprise Sapphire or other suitable material. A plurality of rhombohedrally aligned SiGe (111)-oriented crystals are disposed on the (0001) C-plane of the crystal substrate. A first region of material is disposed on the rhombohedrally aligned SiGe layer. The first region comprises an intrinsic or doped Si, Ge, or SiGe layer. The first region can be layered between two secondary regions comprising n+doped SiGe or n+doped Ge, whereby the first region collects electrons from the two secondary regions.


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