The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2017

Filed:

Mar. 06, 2014
Applicant:

Kabushiki Kaisha Toshiba, Minato-ku, Tokyo, JP;

Inventors:

Tomoko Matsudai, Tokyo, JP;

Tsuneo Ogura, Kanagawa-ken, JP;

Yuuichi Oshino, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/07 (2006.01); H01L 29/40 (2006.01); H01L 29/66 (2006.01); H01L 29/861 (2006.01); H01L 29/872 (2006.01); H01L 29/06 (2006.01); H01L 29/36 (2006.01); H01L 29/16 (2006.01); H01L 29/22 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0716 (2013.01); H01L 29/0619 (2013.01); H01L 29/0649 (2013.01); H01L 29/407 (2013.01); H01L 29/66143 (2013.01); H01L 29/861 (2013.01); H01L 29/872 (2013.01); H01L 29/1602 (2013.01); H01L 29/1608 (2013.01); H01L 29/2203 (2013.01); H01L 29/36 (2013.01);
Abstract

According to one embodiment, a semiconductor device includes a first and second electrode, a first, second, third and fourth semiconductor region, and a first intermediate metal film. The first region is provided above the first electrode and has a first impurity concentration. The second region is provided above the first region and has a second impurity concentration lower than the first impurity concentration. The third region is provided above the second region and has a third impurity concentration. The fourth region is provided above the second region and has a fourth impurity concentration lower than the third impurity concentration. The second electrode is provided above the third region and the fourth region and is in ohmic contact with the third region. The intermediate metal film is provided between the second electrode and the fourth region. The intermediate metal film forms Schottky junction with the fourth region.


Find Patent Forward Citations

Loading…