The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2017

Filed:

Jan. 26, 2014
Applicant:

Tsinghua University, Beijing, CN;

Inventors:

Jian Cai, Beijing, CN;

Ziyu Liu, Beijing, CN;

Qian Wang, Beijing, CN;

Shuidi Wang, Beijing, CN;

Yang Hu, Beijing, CN;

Yu Chen, Beijing, CN;

Assignee:

TSINGHUA UNIVERSITY, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01);
U.S. Cl.
CPC ...
H01L 24/81 (2013.01); H01L 24/13 (2013.01); H01L 24/14 (2013.01); H01L 24/17 (2013.01); H01L 2224/13011 (2013.01); H01L 2224/13015 (2013.01); H01L 2224/13017 (2013.01); H01L 2224/13023 (2013.01); H01L 2224/14051 (2013.01); H01L 2224/1705 (2013.01); H01L 2224/17107 (2013.01); H01L 2224/8122 (2013.01); H01L 2224/8182 (2013.01); H01L 2224/81193 (2013.01); H01L 2224/81194 (2013.01); H01L 2224/81201 (2013.01); H01L 2224/81345 (2013.01); H01L 2224/81355 (2013.01); H01L 2224/81359 (2013.01); H01L 2224/81897 (2013.01); H01L 2224/94 (2013.01);
Abstract

The present invention provides a bonding method in semiconductor manufacturing process and a bonding structure formed using the same, which can achieve wafer-level bonding under a condition of normal temperature and low pressure. The bonding method comprises generating bonding structures capable of being mutually mechanical interlocked, wherein the frictional heat generated by the bonding structures capable of being mutually mechanical interlocked is higher than the bonding energy therebetween, and utilizing the frictional heat generated by the bonding structures capable of being mutually mechanical interlocked to bond the bonding structures capable of being mutually mechanical interlocked.


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