The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2017

Filed:

Aug. 28, 2015
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Andreas Kurz, Dresden, DE;

Andrei Sidelnicov, Dresden, DE;

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/525 (2006.01); H01L 27/12 (2006.01); H01L 21/84 (2006.01); H01L 29/417 (2006.01); H01L 21/02 (2006.01); H01L 21/762 (2006.01); H01L 29/66 (2006.01); H01L 23/532 (2006.01); H01L 29/16 (2006.01);
U.S. Cl.
CPC ...
H01L 23/5256 (2013.01); H01L 21/02532 (2013.01); H01L 21/76264 (2013.01); H01L 21/84 (2013.01); H01L 23/53209 (2013.01); H01L 27/1203 (2013.01); H01L 29/16 (2013.01); H01L 29/41783 (2013.01); H01L 29/665 (2013.01); H01L 29/6656 (2013.01);
Abstract

A method of manufacturing a semiconductor device with a fuse is provided including the steps of providing a semiconductor-on-insulator (SOI) structure including an insulating layer and a semiconductor layer formed on the insulating layer, forming a first raised semiconductor region on the semiconductor layer and a second raised semiconductor region on the semiconductor layer adjacent to the first semiconductor region, and performing a silicidation process of the first and second raised semiconductor regions to form a first at least partially silicided raised semiconductor region with a first silicided portion and a second at least partially silicided raised semiconductor region with a second silicided portion.


Find Patent Forward Citations

Loading…