The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2017

Filed:

May. 20, 2014
Applicant:

Hon Hai Precision Industry Co., Ltd., New Taipei, TW;

Inventor:

Li-Ying Wang He, New Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F21V 9/00 (2015.01); G02B 6/00 (2006.01); F21V 8/00 (2006.01);
U.S. Cl.
CPC ...
G02B 6/0043 (2013.01); G02B 6/0065 (2013.01); Y10T 29/49 (2015.01);
Abstract

A method includes having test plate and light source, the test plate having matrix of first pattern-dots and equally divided into blocks. Intersecting surfaces between the first pattern-dots and the first bottom surface have the same radius r. Detecting a luminous flux Φof each block and a total luminous flux Φof the test plate when light source is activated; calculating an average luminous flux Φ; calculating the radius rof the first pattern-dots in each block assuming that an actual luminous flux of each block is equal to the average luminous flux according to the formula r=r×sqrt (Φ/Φ). Providing a substrate having the same structure as the base and the substrate being divided into blocks according to the same principle as the test plate. Forming second pattern-dots having the same arrangements as the first pattern-dots and having radius of rin each block.


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