The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2017
Filed:
Jul. 09, 2012
Toyohiko Yatagai, Nagareyama, JP;
Cense J. Abraham, Utsunomiya, JP;
Toyohiko Yatagai, Nagareyama, JP;
Cense J. Abraham, Utsunomiya, JP;
UTSUNOMIYA UNIVERSITY, Utsunomiya-shi, Tochigi, JP;
Abstract
An ellipsometry system and a detection unit thereof are capable of achieving miniaturization and price reduction associated therewith. The ellipsometry system includes the detection unit that: has an optical polarization element; separates an interference polarization beam obtained by causing the object-reflected polarization beam and reference reflected polarization beam to interfere with each other into a plurality of interference polarization beams on a wavelength basis; and detects the respective separated polarization components in each wavelength. The optical polarization element: has a birefringence characteristic including a first refractive index and a second refractive index; receives the separated interference polarization beams of the respective wavelengths in a wavelength order and in a parallel manner; separates the separated interference polarization beam of each wavelength, on a polarization component basis, while transmitting the same, and outputs the respective separated polarization components in each wavelength in the same direction but along different optical axes.