The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2017
Filed:
Jan. 13, 2012
Yingjun Jin, Kanagawa, JP;
Takahiro Shibata, Kanagawa, JP;
Junichi Koyama, Kanagawa, JP;
Hitoshi Omata, Kanagawa, JP;
Yingjun Jin, Kanagawa, JP;
Takahiro Shibata, Kanagawa, JP;
Junichi Koyama, Kanagawa, JP;
Hitoshi Omata, Kanagawa, JP;
AMADA COMPANY, LIMITED, Kanagawa, JP;
Abstract
A device for regulating a residual stress is comprised of: input means; a residual stress database; a process condition database; first searching means for searching a residual stress (σ0) from the residual stress database; a calculator for calculating a first bending moment (Mrs) in a ridge line originated from the residual stress, and a second bending moment (Mz) in the ridge line originated from bending to obtain a total bending moment (Mrs−Mz) and calculating a camber curvature (ρz) of the workpiece originated from the total bending moment (Mrs−Mz); comparing a difference (|ρz−ρz0|) between the camber curvature (ρz) and a target value (ρz0) with a tolerable value (ρ); second searching means for searching a process condition satisfying a tolerable condition (|ρz−ρz0|≦ρ) from the process condition database when (|ρz−ρz0|>ρ); and regulating means for regulating a residual stress.