The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2017
Filed:
Dec. 04, 2013
Applicant:
Israel Perez, San Diego, CA (US);
Inventor:
Israel Perez, San Diego, CA (US);
Assignee:
The United States of America as represented by Secretary of the Navy, Washington, DC (US);
Primary Examiner:
Int. Cl.
CPC ...
B01D 67/00 (2006.01); B01D 71/02 (2006.01); B01D 61/02 (2006.01);
U.S. Cl.
CPC ...
B01D 67/0062 (2013.01); B01D 67/0072 (2013.01); B01D 71/021 (2013.01); B01D 61/025 (2013.01);
Abstract
The present invention is a method of controlling the perforation of crystalline grains in a layer of material. The first step of the method creates at least one crystalline layer composed of multiple grains and at least one grain boundary. Next, a material covers the grain boundaries to create a protective, reinforcing coating on the crystalline layer. Finally, an etching process creates perforations in the grains while the grain boundaries are protected from etching by the coating.