The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2017
Filed:
Mar. 23, 2015
Applicant:
Tdk Corporation, Tokyo, JP;
Inventor:
Tadamasa Iwamoto, Tokyo, JP;
Assignee:
TDK Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/677 (2006.01); H01L 21/673 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67389 (2013.01); H01L 21/67017 (2013.01); H01L 21/67772 (2013.01); H01L 21/67775 (2013.01);
Abstract
An object is to prevent down flow gas from entering into a pod in an open state in an EFEM system. An upper canopy is provided along the upper edge of an opening portion on the mini-environment side to block down flow along the opening portion. The upper canopy provides a space in which inert gas supplied through a supply port provided in the pod flows into the mini-environment through the opening of the pod after circulating inside the pod. The down flow has no effect in this space, and the entrance of down flow into the pod can be prevented.