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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9607847 B1

PDFFull Text
Date of Patent:
Mar. 28, 2017

Filed:

Dec. 18, 2015

Enhanced lateral cavity etch

Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Brian E. Goodlin, Plano, TX (US);

Karen H. R. Kirmse, Richardson, TX (US);

Iqbal R. Saraf, Wappingers Falls, NY (US);

Assignee:

TEXAS INSTRUMENTS INCORPORATED, Dallas, TX (US);

Attorneys:

Jacqueline J. Garner

Charles A. Brill

Frank D. Cimino

Primary Examiner:

Julio J Maldonado

Assistant Examiner:

Moin Rahman

Int. Cl.
CPC ...
H01L 21/326 (2006.01); H01L 31/00 (2006.01); H01L 21/3065 (2006.01); H01L 49/02 (2006.01); H01L 37/00 (2006.01); H01L 29/16 (2006.01); H01L 29/161 (2006.01); H01L 29/06 (2006.01); H01L 21/308 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3065 (2013.01); H01L 21/3081 (2013.01); H01L 21/31058 (2013.01); H01L 28/10 (2013.01); H01L 29/0657 (2013.01); H01L 29/16 (2013.01); H01L 29/161 (2013.01); H01L 37/00 (2013.01);
Abstract

A cavity is formed in a semiconductor substrate wherein the width of the cavity is greater than the depth of the cavity and wherein the depth of the cavity is non uniform across the width of the cavity. The cavity may be formed under an electronic device in the semiconductor substrate. The cavity is formed in the substrate by performing a first cavity etch followed by repeated cycles of polymer deposition, cavity etch, and polymer removal.

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Goodlin, Brian. (2017). Enhanced lateral cavity etch (U.S. Patent No. 9607847). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9607847

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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