The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2017
Filed:
Oct. 08, 2010
Applicant:
Heikki Johannes Sipilä, Espoo, FI;
Inventor:
Heikki Johannes Sipilä, Espoo, FI;
Assignee:
HS FOILS OY, Espoo, FI;
Primary Examiner:
Int. Cl.
CPC ...
H01J 35/18 (2006.01); G21K 1/00 (2006.01); G21K 1/02 (2006.01); H01J 5/18 (2006.01); H01L 31/028 (2006.01);
U.S. Cl.
CPC ...
G21K 1/00 (2013.01); G21K 1/02 (2013.01); H01J 5/18 (2013.01); H01L 31/028 (2013.01); H01J 2235/183 (2013.01); H01J 2235/186 (2013.01);
Abstract
For manufacturing a radiation window for an X-ray measurement apparatus, and etch stop layer is first produced on a polished surface of a carrier. A thin film deposition technique is used to produce a structural layer on an opposite side of said etch stop layer than said carrier. The combined structure comprising said carrier, said etch stop layer, and said structural layer is attached to a region around an opening in a support structure with said structural layer facing said support structure. The carrier is etched away.