The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2017
Filed:
Apr. 20, 2012
Applicant:
John Christopher Rudin, Bristol, GB;
Inventor:
John Christopher Rudin, Bristol, GB;
Assignee:
Hewlett-Packard Development Company, L.P., Houston, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2006.01); G03F 7/20 (2006.01); G01N 21/956 (2006.01); G01N 21/3563 (2014.01); G01N 21/88 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G01N 21/956 (2013.01); G03F 7/704 (2013.01); G03F 7/70483 (2013.01); G01N 21/3563 (2013.01); G01N 2021/8854 (2013.01); G01N 2021/9513 (2013.01);
Abstract
Embodiments of the present invention provide systems and method for adaptively generating a pattern for fabricating semiconductor devices, the method comprising obtaining image data of a surface, and dynamically modifying a pattern to be applied to the surface based on the obtained image data.