The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2017
Filed:
Aug. 13, 2014
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Yoshinori Hirano, Annaka, JP;
Hideyoshi Yanagisawa, Annaka, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/038 (2006.01); G03F 7/38 (2006.01); G03F 7/023 (2006.01); G03F 7/40 (2006.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0384 (2013.01); B81C 1/00111 (2013.01); G03F 7/00 (2013.01); G03F 7/023 (2013.01); G03F 7/0236 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); B81B 2203/0384 (2013.01); Y10S 430/122 (2013.01); Y10S 430/123 (2013.01);
Abstract
A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, and etching away the sacrificial film pattern through an aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) coating a substrate with a composition comprising a cresol novolac resin, a crosslinker, and a photoacid generator, (B) heating to form a sacrificial film, (C) patternwise exposure, (D) development to form a sacrificial film pattern, and (E) forming crosslinks within the cresol novolac resin.