The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2017
Filed:
May. 28, 2014
Gachon University of Industry-academic Cooperation Foundation, Gyeonggi-do, KR;
Jun Young Chung, Incheon, KR;
Hyun Wook Park, Daejeon, KR;
Gachon University of Industry-Academic cooperation Foundation, Gyeonggi-Do, KR;
Abstract
A first off resonance radio frequency (RF) pulse and a second off resonance RF pulse having a phase difference of 180 degrees from the first off resonance RF pulse are applied, one or more auxiliary gradient magnetic fields for offsetting inhomogeneity of a main magnetic field generated by applying the first and second off resonance RF pulses are applied, and magnitudes and signs of the auxiliary gradient magnetic fields are appropriately adjusted. Therefore, artifacts generated due to inhomogeneity of a main magnetic field in an imaging method using an off resonance RF pulse may be removed. When this method is applied to an imaging method using a spatial pre-saturation RF pulse, the phenomenon in which spins excited by the pre-saturation RF pulse are excited again by the off resonance RF pulse to return signals, such that undesired signals overlap and appear in an ultimately-obtained signal, may be removed.