The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2017
Filed:
Aug. 27, 2013
Us Synthetic Corporation, Orem, UT (US);
Julie Ann Kidd, North Ogden, UT (US);
Michael A. Vail, Genola, UT (US);
US SYNTHETIC CORPORATION, Orem, UT (US);
Abstract
Embodiments of the invention relate to methods of modeling leaching behavior of a polycrystalline diamond ('PCD') material used in leached polycrystalline diamond compacts ('PDCs') and methods of monitoring leaching of a PCD material. In an embodiment, a method of modeling leaching behavior is disclosed. A PCD table is provided, which includes a plurality of bonded diamond grains defining a plurality of interstitial regions in which a metallic material is disposed. The PCD table is leached with a leaching agent to at least partially remove the metallic material from the PCD table. A leach depth of the PCD table is determined. A concentration of at least one constituent of the leaching agent is also determined. The leach depth is correlated with the concentration of the at least one metal to generate the model of leaching behavior.