The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2017
Filed:
Sep. 10, 2012
Yuji Ikeda, Kobe, JP;
Ryoji Tsuruoka, Kobe, JP;
Yuji Ikeda, Kobe, JP;
Ryoji Tsuruoka, Kobe, JP;
IMAGINEERING, INC., Kobe, JP;
Abstract
The objective of the present invention is to reduce the dispersion of a powdered substance, which is the target substance, during the analysis period in an analyzing device that analyzes the target substance by analyzing the light originated from the substance which is in the plasma state. The present invention relates to an analyzing device including a plasma generation means which generates plasma in the space and maintains plasma using the energy of EM radiation emitted from a radiation antenna; and an optical analysis means which analyzes a target substance by analyzing the plasma light generated from target substance of plasma state in the plasma area during the plasma maintenance period where the plasma is maintained by the plasma generation means using the energy of EM radiation. The plasma generation means emits the EM radiation from the radiation antenna in continuous waves during the plasma maintenance period.