The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2017
Filed:
Oct. 19, 2011
Applicants:
Shin-ichi Ogino, Ibaraki, JP;
Atsushi Nara, Ibaraki, JP;
Hideo Takami, Ibaraki, JP;
Inventors:
Assignee:
JX Nippon Mining & Metals Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C22C 5/04 (2006.01); C22C 19/07 (2006.01); G11B 5/851 (2006.01); H01F 41/18 (2006.01); C22C 32/00 (2006.01); C22C 33/02 (2006.01); B22F 3/14 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); C22C 5/04 (2013.01); C22C 19/07 (2013.01); C22C 32/0026 (2013.01); C22C 33/0292 (2013.01); G11B 5/851 (2013.01); H01F 41/183 (2013.01); B22F 3/14 (2013.01); C22C 2202/02 (2013.01);
Abstract
A sputtering target for a magnetic recording film containing SiO, wherein a peak strength ratio of a (011) plane of quartz relative to a background strength (i.e. quartz peak strength/background strength) in an X-ray diffraction is 1.40 or more. An object of this invention is to obtain a sputtering target for a magnetic recording film capable of inhibiting the formation of cristobalites in the target which cause the generation of particles during sputtering, shortening the burn-in time, magnetically and finely separating the single-domain particles after deposition, and improving the recording density.