The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2017
Filed:
Oct. 07, 2011
Masamichi Hikosaka, Hiroshima, JP;
Kiyoka Okada, Hiroshima, JP;
Junichiro Washiyama, Kanagawa, JP;
Takeshi Nakajima, Kanagawa, JP;
Yuka Akiyama, Kanagawa, JP;
Shingo Ueno, Hiroshima, JP;
Masamichi Hikosaka, Hiroshima, JP;
Kiyoka Okada, Hiroshima, JP;
Junichiro Washiyama, Kanagawa, JP;
Takeshi Nakajima, Kanagawa, JP;
Yuka Akiyama, Kanagawa, JP;
Shingo Ueno, Hiroshima, JP;
SUNALLOMER LTD., Tokyo, JE;
HIROSHIMA UNIVERSITY, Hiroshima, JP;
Abstract
A method for secondary-molding a polymer nano oriented crystal material in accordance with an embodiment of the present invention includes the steps of: heating the polymer nano oriented crystal material so that the polymer nano oriented crystal material changes into a mobile phase or a melt having a dense entanglement network structure; molding the polymer nano oriented crystal material which changed into the mobile phase or the melt including the dense entanglement network in the step; and cooling the polymer nano oriented crystal material, which has undergone the step, until the polymer nano oriented crystal material changes into an ordered phase.