The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 28, 2017

Filed:

Dec. 19, 2013
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Masanori Ikari, Annaka, JP;

Tadakatsu Shimada, Annaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C04B 35/645 (2006.01); C01F 17/00 (2006.01); C04B 35/50 (2006.01); C04B 35/505 (2006.01);
U.S. Cl.
CPC ...
C01F 17/0043 (2013.01); C04B 35/50 (2013.01); C04B 35/505 (2013.01); C04B 35/6455 (2013.01); C01P 2006/60 (2013.01); C04B 2235/3206 (2013.01); C04B 2235/3217 (2013.01); C04B 2235/3224 (2013.01); C04B 2235/3225 (2013.01); C04B 2235/3232 (2013.01); C04B 2235/3244 (2013.01); C04B 2235/3286 (2013.01); C04B 2235/3287 (2013.01); C04B 2235/3296 (2013.01); C04B 2235/3298 (2013.01); C04B 2235/3418 (2013.01); C04B 2235/5436 (2013.01); C04B 2235/6562 (2013.01); C04B 2235/661 (2013.01); C04B 2235/786 (2013.01); C04B 2235/9653 (2013.01);
Abstract

Provided is a light transmitting metal oxide sintered body manufacturing method for obtaining a light transmitting sintered body, the main component of which is metal oxide, by carrying out hot isostatic pressing at a HIP heat processing temperature (T) set in a temperature range of 1000-2000° C. The light transmitting metal oxide sintered body manufacturing method, by which light transmitting properties can be improved, is characterized by the following: in the temperature elevating step of the hot isostatic pressing, a temperature range (S) from room temperature to the HIP heat processing temperature (T) is divided into a plurality of stages; for each divided stage the temperature elevation rate is controlled; and the temperature elevation rate of a final stage (14) that includes at least the HIP heat processing temperature (T) is 10° C./h to 180° C./h.


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