The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2017
Filed:
Jul. 08, 2011
Golden Kumar, Lubbock, TX (US);
Jan Schroers, Hamden, CT (US);
Jerzy Blawzdziewicz, Lubbock, TX (US);
Thomas Hodges, North Haven, CT (US);
Golden Kumar, Lubbock, TX (US);
Jan Schroers, Hamden, CT (US);
Jerzy Blawzdziewicz, Lubbock, TX (US);
Thomas Hodges, North Haven, CT (US);
Yale University, New Haven, CT (US);
Abstract
A method of processing BMGs in a non-ideal environment (such as air) to create a uniform and smooth surface is provided. By utilizing the contact-line movement and an engineered flow pattern during TPF the method is able to create complex BMG parts that exhibit uniform smooth appearance or even can be atomically smooth. In addition, to mending surface imperfections, this method also eliminates void formation inside the material, allows for the creation of precise patterns of homogeneous appearance, and forms improved mechanical locks between different materials and a BMG.