The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 28, 2017

Filed:

Mar. 12, 2015
Applicant:

Pall Corporation, Port Washington, NY (US);

Inventors:

Khaled Abdel-Hakim Helmy Aamer, Port Washington, NY (US);

Amarnauth Singh, Selden, NY (US);

Selina Shi, Levittown, NY (US);

Assignee:

Pall Corporation, Port Washington, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 71/80 (2006.01); B01D 69/10 (2006.01); B01D 71/64 (2006.01); B01D 67/00 (2006.01); B01D 71/62 (2006.01); C08J 5/22 (2006.01); C08G 61/12 (2006.01); B01D 69/02 (2006.01); B01D 69/06 (2006.01); B01D 71/44 (2006.01);
U.S. Cl.
CPC ...
B01D 71/80 (2013.01); B01D 67/0018 (2013.01); B01D 67/0083 (2013.01); B01D 71/62 (2013.01); B01D 71/64 (2013.01); C08G 61/12 (2013.01); C08J 5/2256 (2013.01); B01D 69/02 (2013.01); B01D 69/06 (2013.01); B01D 71/44 (2013.01); B01D 2323/26 (2013.01); B01D 2325/021 (2013.01); C08G 2261/126 (2013.01); C08G 2261/148 (2013.01); C08G 2261/1412 (2013.01); C08G 2261/3342 (2013.01); C08G 2261/418 (2013.01);
Abstract

Disclosed are membranes formed from self-assembling block copolymers, for example, a diblock copolymer of the formula (I): wherein R—R, n, and m are as described herein, which find use in preparing nanoporous membranes. Embodiments of the membranes contain the block copolymer that self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such membrane which involves spray coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by annealing the thin film in a solvent vapor and/or soaking in a solvent or mixture of solvents to form a nanoporous membrane.


Find Patent Forward Citations

Loading…