The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2017
Filed:
May. 14, 2015
Applicant:
Nec Laboratories America, Inc., Princeton, NJ (US);
Inventors:
Zhiyun Qian, Riverside, CA (US);
Jun Wang, Santa Clara, CA (US);
Zhichun Li, Princeton, NJ (US);
Zhenyu Wu, Plainsboro, NJ (US);
Junghwan Rhee, Princeton, NJ (US);
Xia Ning, Carmel, IN (US);
Guofei Jiang, Princeton, NJ (US);
Assignee:
NEC Corporation, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 21/00 (2013.01); H04L 29/06 (2006.01); G06N 99/00 (2010.01); G06F 11/30 (2006.01); G06F 21/50 (2013.01); G06F 21/55 (2013.01);
U.S. Cl.
CPC ...
H04L 63/1425 (2013.01); G06F 11/30 (2013.01); G06F 21/50 (2013.01); G06F 21/552 (2013.01); G06F 21/554 (2013.01); G06N 99/005 (2013.01); H04L 63/1441 (2013.01);
Abstract
Methods and systems for process constraint include collecting system call information for a process. It is detected whether the process is idle based on the system call information and then whether the process is repeating using autocorrelation to determine whether the process issues system calls in a periodic fashion. The process is constrained if it is idle or repeating to limit an attack surface presented by the process.