The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2017
Filed:
Sep. 27, 2013
Applicant:
Apple Inc., Cupertino, CA (US);
Inventors:
Lili Huang, San Jose, CA (US);
Richard M. Mank, Cupertino, CA (US);
Assignee:
Apple Inc., Cupertino, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 3/00 (2006.01); H01M 4/131 (2010.01); H01M 4/139 (2010.01); H01M 4/1391 (2010.01); H01M 4/04 (2006.01); H01M 4/02 (2006.01);
U.S. Cl.
CPC ...
H01M 4/131 (2013.01); H01M 4/0471 (2013.01); H01M 4/139 (2013.01); H01M 4/1391 (2013.01); H01M 4/0423 (2013.01); H01M 2004/021 (2013.01); Y02E 60/122 (2013.01); Y02P 70/54 (2015.11);
Abstract
A method of annealing a thin film deposited on a substrate. According to the method, the thin film deposited on the substrate is provided. The provided thin film is irradiated with electromagnetic radiation until a predetermined crystal quality of the thin film is achieved. The spectral band of the electromagnetic radiation is selected such that the thin film is substantially absorptive to the electromagnetic radiation and the substrate is substantially transparent to the electromagnetic radiation.