The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2017
Filed:
Dec. 19, 2014
Applicant:
Spts Technologies Limited, Newport, GB;
Inventor:
Huma Ashraf, Newport, GB;
Assignee:
SPTS Technologies Limited, Newport, GB;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/76 (2006.01); H01L 21/3065 (2006.01); H01L 21/033 (2006.01); H01L 21/308 (2006.01); H01L 21/02 (2006.01); H01L 21/768 (2006.01); H01L 23/48 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30655 (2013.01); H01L 21/0212 (2013.01); H01L 21/0334 (2013.01); H01L 21/3081 (2013.01); H01L 21/3083 (2013.01); H01L 21/3086 (2013.01); H01L 21/76816 (2013.01); H01L 23/481 (2013.01); H01L 2924/0002 (2013.01);
Abstract
A method of etching a feature in a substrate includes forming a mask structure over the substrate, the mask structure defining at least one re-entrant opening, etching the substrate through the opening to form the feature using a cyclic etch and deposition process, and removing the mask.