The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 21, 2017

Filed:

Mar. 09, 2015
Applicant:

Hitachi, Ltd., Chiyoda-ku, Tokyo, JP;

Inventors:

Naruo Watanabe, Tokyo, JP;

Yoshio Takahashi, Tokyo, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01J 37/26 (2006.01); G01L 1/22 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); G01L 1/2262 (2013.01); H01J 37/261 (2013.01); H01J 2237/15 (2013.01); H01J 2237/2002 (2013.01); H01J 2237/202 (2013.01); H01J 2237/204 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/20292 (2013.01); H01J 2237/24578 (2013.01); H01J 2237/24585 (2013.01); H01J 2237/2602 (2013.01);
Abstract

A sample micromotion mechanism adapted to minimize an influence of a disturbance and adjust a sample drift rapidly and with high accuracy, and designed so as to be a compact, easy-to-place sample micromotion mechanism of a side-entry type that suppresses the occurrence of the sample drift and generates/displays high-resolution monitoring images and precisely drawn patterns. A charged particle device employing the sample micromotion mechanism operates followed by deformation which causes a strain. A strain measuring unit measures such strain. The sample micromotion mechanism imparts micromotion so as to reduce the strain in accordance with the measured strain value, thereby reducing deformation of the sample micromotion mechanism.


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