The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 21, 2017

Filed:

Apr. 09, 2012
Applicants:

Steve Demuth, Decorah, IA (US);

Aliza R. Heching, Bronx, NY (US);

Jimeng Sun, White Plains, NY (US);

Judah M. Diament, Bergenfield, NJ (US);

Inventors:

Steve Demuth, Decorah, IA (US);

Aliza R. Heching, Bronx, NY (US);

Jimeng Sun, White Plains, NY (US);

Judah M. Diament, Bergenfield, NJ (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06Q 10/06 (2012.01); G06N 5/04 (2006.01); G06N 5/00 (2006.01); G06F 17/30 (2006.01);
U.S. Cl.
CPC ...
G06Q 10/067 (2013.01); G06Q 10/06 (2013.01); G06F 17/30864 (2013.01); G06N 5/00 (2013.01); G06N 5/04 (2013.01);
Abstract

Common sub-process patterns in a plurality of deployed process models may be discovered, and performance measures associated with the sub-process patterns may be computed based on runtime events of the deployed process models. Positive or negative performance patterns among sub-process patterns may be identified and used for creating new process models or improving existing process models.


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