The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2017
Filed:
Dec. 23, 2014
Emc Corporation, Hopkinton, MA (US);
Diego Salomone Bruno, Rio de Janeiro, BR;
EMC IP Holding Company LLC, Hopkinton, MA (US);
Abstract
Event data collected for a given event is obtained, wherein the event data comprises a plurality of time series data sets. The plurality of time series data sets are divided into a set of time windows (e.g., epochs). Data in the plurality of time series data sets occurring within each time window of the set of time windows is aligned. A metric is computed for each aligned time window, wherein the metric for each aligned time window represents a measure of at least one of completeness and support attributable to data in the aligned time window. Data is pruned from the set of event data for one or more of the set of time windows based on the computed metrics. The pruned event data is provided to a data analytics process which is configured to further process the pruned event data.