The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2017
Filed:
Dec. 16, 2013
Applicants:
Arkema France, Colombes, FR;
Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;
Inventors:
Christophe Navarro, Bayonne, FR;
Maxime Argoud, Saint Clair de la Tour, FR;
Xavier Chevalier, Grenoble, FR;
Raluca Tiron, Saint-Martin-le-Vinoux, FR;
Ahmed Gharbi, Grenoble, FR;
Assignees:
ARKEMA FRANCE, Colombes, FR;
COMMISSARIAT A L' ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, Paris, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 1/76 (2012.01); G03F 1/00 (2012.01); B82Y 30/00 (2011.01); H01L 21/027 (2006.01); C08L 53/00 (2006.01); G03F 7/00 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 1/76 (2013.01); B82Y 30/00 (2013.01); C08L 53/00 (2013.01); G03F 1/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/325 (2013.01); H01L 21/0274 (2013.01);
Abstract
The invention concerns a manufacturing method for nanolithography masks from a PS-b-PMMA block copolymer film deposited on a surface to be etched, said copolymer film comprising PMMA nanodomains orientated perpendicularly to the surface to be etched, said method being characterized in that it comprises the following steps: