The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 21, 2017

Filed:

May. 05, 2015
Applicants:

Hung-wei Liu, Hsin-Chu, TW;

Chin-ku Liu, Hsin-Chu, TW;

Inventors:

Hung-Wei Liu, Hsin-Chu, TW;

Chin-Ku Liu, Hsin-Chu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V 5/04 (2006.01); G02B 19/00 (2006.01); G02B 3/08 (2006.01); G02F 1/1335 (2006.01);
U.S. Cl.
CPC ...
G02B 19/0061 (2013.01); G02B 3/08 (2013.01); G02B 19/0028 (2013.01); G02F 2001/133607 (2013.01);
Abstract

A lens includes a central portion and a surrounding portion. The central portion has a first and a second optical surfaces. The surrounding portion surrounds the central portion and has an inner refraction wall and an outer refraction wall. The outer refraction wall includes a first and a second outer surfaces. A distance between the symmetry axis and a junction of the inner refraction wall and the first optical surface is a first radius R. A distance between the symmetry axis and a junction of the first outer surface and the second optical surface is a second radius R. A distance between the symmetry axis and a junction of the second outer surface and the first outer surface is a third radius R. The third radius Ris greater than the second radius R, and the second radius Ris greater than or equal to the first radius R


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