The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2017
Filed:
Mar. 12, 2015
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Shuhei Ueda, Joetsu, JP;
Masaki Takeuchi, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01); G01V 8/12 (2006.01); C23C 16/02 (2006.01); C03C 17/09 (2006.01); C03C 23/00 (2006.01); B24B 37/04 (2012.01); B24B 49/12 (2006.01);
U.S. Cl.
CPC ...
G01V 8/12 (2013.01); B24B 37/042 (2013.01); B24B 49/12 (2013.01); C03C 15/00 (2013.01); C03C 17/09 (2013.01); C03C 23/007 (2013.01); C03C 23/0075 (2013.01); C23C 16/0227 (2013.01); C03C 2204/08 (2013.01); C03C 2217/252 (2013.01); C03C 2217/258 (2013.01); C03C 2217/28 (2013.01);
Abstract
A synthetic quartz glass substrate having front and back surfaces is worked by lapping, etching, mirror polishing, and cleaning steps for thereby polishing the front surface of the substrate to a mirror-like surface. The etching step is carried out using a hydrofluoric acid solution at pH 4-7.