The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 21, 2017

Filed:

Aug. 26, 2015
Applicant:

Sandia Corporation, Albuquerque, NM (US);

Inventors:

Joshua Beutler, Albuquerque, NM (US);

John Joseph Clement, Albuquerque, NM (US);

Mary A. Miller, Albuquerque, NM (US);

Jeffrey Stevens, Albuquerque, NM (US);

Edward I. Cole, Jr., Albuquerque, NM (US);

Assignee:

Sandia Corporation, Albuquerque, NM (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G01R 31/311 (2006.01); H01L 21/66 (2006.01); H01L 21/3065 (2006.01); H01L 21/67 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G01R 31/311 (2013.01); G01N 21/9501 (2013.01); H01L 21/3065 (2013.01); H01L 21/67253 (2013.01); H01L 22/20 (2013.01);
Abstract

The various technologies presented herein relate to utilizing visible light in conjunction with a thinned structure to enable characterization of operation of one or more features included in an integrated circuit (IC). Short wavelength illumination (e.g., visible light) is applied to thinned samples (e.g., ultra-thinned samples) to achieve a spatial resolution for laser voltage probing (LVP) analysis to be performed on smaller technology node silicon-on-insulator (SOI) and bulk devices. Thinning of a semiconductor material included in the IC (e.g., backside material) can be controlled such that the thinned semiconductor material has sufficient thickness to enable operation of one or more features comprising the IC during LVP investigation.


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