The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2017
Filed:
Sep. 10, 2009
Applicants:
Fernando Patolsky, Rechovot, IL;
Roey Elnathan, Jerusalem, IL;
Raisa Kantaev, Ashdod, IL;
Inventors:
Assignee:
Ramot at Tel-Aviv University Ltd., Tel-Aviv, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 5/055 (2006.01); C25D 1/00 (2006.01); B82Y 15/00 (2011.01); B82Y 30/00 (2011.01); C25D 5/10 (2006.01); C25D 5/18 (2006.01); C25D 13/04 (2006.01); C25D 11/04 (2006.01);
U.S. Cl.
CPC ...
C25D 1/006 (2013.01); B82Y 15/00 (2013.01); B82Y 30/00 (2013.01); C25D 5/10 (2013.01); C25D 5/18 (2013.01); C25D 13/04 (2013.01); B01J 2219/005 (2013.01); B01J 2219/00504 (2013.01); B01J 2219/00547 (2013.01); C25D 11/04 (2013.01); Y10T 29/49826 (2015.01); Y10T 428/10 (2015.01); Y10T 428/12493 (2015.01); Y10T 428/12528 (2015.01); Y10T 428/12542 (2015.01); Y10T 428/12556 (2015.01); Y10T 428/12826 (2015.01); Y10T 428/12868 (2015.01); Y10T 428/12889 (2015.01); Y10T 428/298 (2015.01); Y10T 428/2913 (2015.01);
Abstract
A process of preparing a plurality of nanostructures, each being composed of at least one target material is disclosed. The process comprises sequentially electrodepositing a first material and the at least one target material into pores of a porous membrane having a nanometric pore diameter, to thereby obtain within the pores nanometric rods, each of the nanometric rods having a plurality of segments where any two adjacent segments are made of different materials. The process further comprises and etching the membrane and the first material, thereby obtaining the nanostructures.