The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2017
Filed:
Jul. 23, 2014
Applicant:
Uchicago Argonne, Llc, Chicago, IL (US);
Inventors:
Jeffrey W. Elam, Elmhurst, IL (US);
Angel Yanguas-Gil, Naperville, IL (US);
Joseph A. Libera, Clarendon Hills, IL (US);
Assignee:
UCHICAGO ARGONNE, LLC, Chicago, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/455 (2006.01); H01L 51/56 (2006.01); H01L 51/44 (2006.01); C23C 16/442 (2006.01); C23C 16/54 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45551 (2013.01); C23C 16/442 (2013.01); C23C 16/45527 (2013.01); C23C 16/545 (2013.01); H01L 51/001 (2013.01); H01L 51/0029 (2013.01); H01L 51/448 (2013.01); H01L 51/56 (2013.01); Y02E 10/549 (2013.01); Y02P 70/521 (2015.11);
Abstract
A system and method for continuous atomic layer deposition. The system and method includes a housing, a moving bed which passes through the housing, a plurality of precursor gases and associated input ports and the amount of precursor gases, position of the input ports, and relative velocity of the moving bed and carrier gases enabling exhaustion of the precursor gases at available reaction sites.