The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2017
Filed:
Jul. 31, 2013
Applicant:
Cheil Industries, Inc., Gumi-si, Gyeongsangbuk-do, KR;
Inventors:
Seong Ryong Nam, Uiwang-si, KR;
Ji Hye Kwon, Uiwang-si, KR;
Yeon Soo Lee, Uiwang-si, KR;
Ji Yeon Lee, Uiwang-si, KR;
Chang Min Lee, Uiwang-si, KR;
Min Haeng Cho, Uiwang-si, KR;
Seung Jib Choi, Uiwang-si, KR;
Kyoung Jin Ha, Uiwang-si, KR;
Assignee:
CHEIL INDUSTRIES, INC., Gumi-Si, Gyeongsangbuk-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 33/14 (2006.01); C09D 4/00 (2006.01); C08F 220/36 (2006.01); H01L 51/52 (2006.01); H01L 51/00 (2006.01); H01L 31/048 (2014.01); H01L 23/29 (2006.01); H01L 23/31 (2006.01);
U.S. Cl.
CPC ...
C09D 4/00 (2013.01); C08F 220/36 (2013.01); C08L 33/14 (2013.01); H01L 23/293 (2013.01); H01L 23/3121 (2013.01); H01L 23/3135 (2013.01); H01L 31/048 (2013.01); H01L 51/004 (2013.01); H01L 51/5253 (2013.01); C08F 2220/365 (2013.01); H01L 2251/301 (2013.01); H01L 2251/558 (2013.01); H01L 2924/0002 (2013.01);
Abstract
The present invention relates to an encapsulating composition, a barrier layer including the same, and an encapsulated apparatus including the same, and the composition comprises (A) a photocurable monomer and (B) a photocurable monomer containing a carboxylic acid group, wherein (B) the photocurable monomer containing the carboxylic acid group has an amide bond.