The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2017
Filed:
Oct. 22, 2012
Wei Qian, Torrance, CA (US);
Joan Fong, San Marino, CA (US);
Dazeng Feng, El Monte, CA (US);
Jay Jie Lai, Artesia, CA (US);
Wei Qian, Torrance, CA (US);
Joan Fong, San Marino, CA (US);
Dazeng Feng, El Monte, CA (US);
Jay Jie Lai, Artesia, CA (US);
Mellanox Technologies Silicon Photonics Inc., Monterey Park, CA (US);
Abstract
An optical device is formed from a device precursor having a layer of a light-transmitting medium on a base. A first feature is formed on the device precursor. The device precursor is then processed such that a stop layer protects the first feature and a portion of the device precursor is above the top of the stop layer. The first feature is between the base and the stop layer. The device precursor is planarized such that the portion of the device precursor located above the top of the stop layer becomes flush with the top of the portion of the stop layer that is present on the device precursor after the planarization. During the planarization, the stop layer acts as a planarization stop that slows or stops the rate of planarization.